Li-Shun Wang

Title: The Innovative Contributions of Li-Shun Wang

Introduction

Li-Shun Wang is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of technology, particularly in the area of substrate processing. His work has been recognized for its innovative approach to solving complex problems in the industry.

Latest Patents

Li-Shun Wang holds a patent for a method and apparatus for the removal of residue from a substrate. This patent, which involves the introduction of a slurry onto a metal layer and the polishing of that layer, showcases his expertise in materials science. The method further includes the use of a solution comprising hydrogen peroxide to effectively remove particles from a metal plug on the substrate. This innovative approach has the potential to enhance manufacturing processes in semiconductor fabrication.

Career Highlights

Li-Shun Wang is currently employed at Intel Corporation, a leading technology company known for its advancements in semiconductor technology. His role at Intel has allowed him to work on cutting-edge projects that push the boundaries of innovation. With a focus on improving substrate processing techniques, he has contributed to the development of more efficient manufacturing methods.

Collaborations

Li-Shun Wang collaborates with various professionals in his field, including his coworker John K. Chu. Their combined expertise fosters an environment of innovation and creativity, leading to advancements in technology and manufacturing processes.

Conclusion

Li-Shun Wang's contributions to the field of substrate processing exemplify the spirit of innovation that drives the technology industry forward. His patent and work at Intel Corporation highlight his commitment to improving manufacturing techniques. Through his efforts, he continues to make a significant impact in the world of technology.