Taipei, Taiwan

Li-Ray Chen

This inventor holds 3 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignees: Seirus Innovative Accessories, Inc., Serius Innovative Accessories, Inc.. Active years: 2019-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Li-Ray Chen. Retrieved from https://idiyas.com/inventor/li-ray-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0


Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • San Diego, CA (US) (2019)
  • Taipei, TW (2021 - 2023)

Company Filing History:


Years Active: 2019-2023

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3 patents (USPTO):Explore Patents

Title: Innovations of Li-Ray Chen

Introduction

Li-Ray Chen is a notable inventor based in Taipei, Taiwan. She has made significant contributions to the field of innovative head garments, holding a total of 3 patents. Her work reflects a commitment to enhancing user experience through practical and creative designs.

Latest Patents

One of her latest inventions is the Magnetic Mask. This head garment features a base section and a face section, where the face section is both affixed to the base section and can be releasably extended over the user's face. This design creates a magnetic seal against the elements, providing protection and comfort. Additionally, the head garment includes a magnetic fastener that helps position the face covering section when it is not in use.

Career Highlights

Li-Ray Chen has worked with Seirus Innovative Accessories, Inc., where she has been able to apply her inventive skills in a collaborative environment. Her experience in the industry has allowed her to refine her designs and contribute to innovative solutions in headwear.

Collaborations

Li-Ray has collaborated with Robert J Murphy, who has been a valuable coworker in her inventive journey.

Conclusion

Li-Ray Chen's innovative spirit and dedication to her craft are evident in her patents and career achievements. Her contributions to head garment technology continue to inspire and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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