Suwon, South Korea

Li Ming

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Li Ming. Retrieved from https://idiyas.com/inventor/li-ming-cq9tqro5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Innovations by Inventor Li Ming in Semiconductor Fabrication

Introduction

Li Ming, an innovative inventor based in Suwon-si, South Korea, has made significant contributions to the field of semiconductor technology. Currently employed at Samsung Electronics Co., Ltd., he has a noteworthy patent that enhances the fabrication processes of semiconductor devices, particularly in the creation of metal oxide semiconductor (MOS) transistors.

Latest Patents

Li Ming holds a patent entitled "Methods of fabricating devices including source/drain region with abrupt junction profile." This patent outlines methods that include the formation of a gate pattern on a semiconductor substrate. The process involves etching the substrate using the gate as a mask to create active trenches. Subsequently, epitaxial layers are fabricated within these trenches, structured by stacking first and second semiconductor layers. Each layer is specifically designed with different composition ratios and lattice constants relative to the substrate, facilitating advanced semiconductor devices.

Career Highlights

Throughout his career at Samsung Electronics Co., Ltd., Li Ming has focused on the development and improvement of semiconductor manufacturing processes. His expertise in etching and layer formation has contributed to the advancement of MOS technology, leveraging his patent to enhance device performance and reliability.

Collaborations

Li Ming has collaborated with talented colleagues, including Sangpil Sim and Kang-ill Seo. Working alongside these professionals, he has aided in the pursuit of innovation in the semiconductor field, combining their knowledge to push boundaries in device fabrication techniques.

Conclusion

With a keen understanding of semiconductor fabrication, inventor Li Ming demonstrates the impact of innovative methodologies on the industry. His patent serves as a testament to the continuous advancements happening within the technology sector, showcasing the essential role of inventors in shaping the future of semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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