SHANGHAI, China

Li L Wang

This inventor holds 1 USPTO granted patent. Top assignee: Signify Holding B.v.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Li L Wang. Retrieved from https://idiyas.com/inventor/li-l-wang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Li L Wang

Introduction

Li L Wang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of optics, particularly with his innovative designs in lens technology. His work has garnered attention for its practical applications in lighting devices.

Latest Patents

Li L Wang holds a patent for a lens plate and a lighting device that incorporates this lens plate. The invention features an array of convex lenses, each designed with a specific height and diameter ratio, ensuring optimal light input and exit surfaces. The height of the lenses ranges from 1.5 mm to 5 mm, making them suitable for various lighting applications.

Career Highlights

Li L Wang is currently employed at Signify Holding B.V., a company known for its advancements in lighting solutions. His role involves developing innovative products that enhance lighting efficiency and quality. His expertise in lens design has positioned him as a valuable asset to the company.

Collaborations

Li L Wang collaborates with his coworker, Lan Deng, to further explore advancements in lighting technology. Their combined efforts aim to push the boundaries of what is possible in the field of optics.

Conclusion

Li L Wang's contributions to lens technology and lighting devices exemplify the spirit of innovation. His patent and ongoing work at Signify Holding B.V. highlight the importance of creativity in advancing modern technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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