Taipei, Taiwan

Li-Kai Cheng


Average Co-Inventor Count = 9.0

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2019-2021

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4 patents (USPTO):

Title: **Li-Kai Cheng: Innovator in EUV Vessel Inspection Technology**

Introduction

Li-Kai Cheng, located in New Taipei, Taiwan, is a remarkable inventor known for his contributions to the semiconductor industry. With a total of four patents to his name, his latest innovations focus on the advanced inspection methods essential for next-generation photolithography technologies.

Latest Patents

One of Li-Kai Cheng's latest patents is the "EUV vessel inspection method and related system." This invention features a single-shot metrology technique for comprehensive inspection of the interior of an Extreme Ultraviolet (EUV) vessel. The method involves integrating an inspection tool with the EUV vessel, allowing for precise movement to a primary focus region. During the inspection process, a uniform light level is provided inside the vessel through an illuminator. A panoramic image of the interior is captured in a single shot, enabling the quantification of tin contamination on various components. This level of contamination can then be compared to key performance indicators (KPIs), followed by the implementation of an Out-of-Control Action Plan (OCAP) if necessary.

Career Highlights

Li-Kai Cheng is currently employed at Taiwan Semiconductor Manufacturing Company Limited (TSMC), where he leverages his expertise in semiconductor technology. His innovative approaches are pivotal in enhancing the efficiency and accuracy of EUV lithography, which is integral to the development of cutting-edge microchips.

Collaborations

Throughout his career, Li-Kai has collaborated with notable colleagues, including Tzung-Chi Fu and Bo-Tsun Liu. These partnerships enrich the innovative environment at TSMC and contribute to the advancement of technologies in the semiconductor sector.

Conclusion

Li-Kai Cheng is an exemplary figure in the field of invention, particularly regarding EUV vessel inspection technologies. His recent patents and collaborations highlight his dedication to innovation and progress within the semiconductor industry. With his continued efforts, the future of photolithography and microchip manufacturing looks promising.

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