Li-Fu Chang

Title: Innovations of Li-Fu Chang in Integrated Circuit Fabrication

Introduction

Li-Fu Chang is a notable inventor based in Sunnyvale, CA, who has made significant contributions to the field of integrated circuit (IC) fabrication. With a total of 2 patents, his work focuses on enhancing the efficiency and accuracy of IC design processes.

Latest Patents

Li-Fu Chang's latest patents include groundbreaking systems and methods for timing-driven shape closure in integrated circuit fabrication. These innovations are part of Integrated Design-Manufacturing Processes (IDMP) that incorporate a delta flow, integrating information related to IC fabrication timing and geometry verification into the design process. The delta flow is an incremental approach that utilizes delta-geometry timing prediction processes and delta-timing shape prediction processes. This allows for the processing of difference information associated with circuit characterization parameters. The delta flow independently re-characterizes an IC design using this delta information, providing incremental outputs that enhance or re-characterize the parameters of devices and interconnect structures without the need for new circuit characterization parameters or re-processing all design information.

Career Highlights

Li-Fu Chang is currently associated with Clear Shape Technologies, Inc., where he continues to innovate in the field of IC fabrication. His work has been instrumental in advancing the methodologies used in the industry, making significant strides in the efficiency of design processes.

Collaborations

Li-Fu Chang has collaborated with notable colleagues, including Yao-Ting Wang and Fang-Cheng Chang, contributing to the development of advanced technologies in integrated circuit design.

Conclusion

Li-Fu Chang's contributions to integrated circuit fabrication through his innovative patents and collaborative efforts highlight his importance in the field. His work continues to influence the future of IC design and manufacturing processes.