The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 15, 2008

Filed:

Nov. 08, 2004
Applicants:

Li-fu Chang, Sunnyvale, CA (US);

Yao-ting Wang, Sunnyvale, CA (US);

Fang-cheng Chang, Sunnyvale, CA (US);

Inventors:

Li-Fu Chang, Sunnyvale, CA (US);

Yao-Ting Wang, Sunnyvale, CA (US);

Fang-Cheng Chang, Sunnyvale, CA (US);

Assignee:

Clear Shape Technologies, Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

Systems and methods for timing-driven shape closure in integrated circuit ('IC') fabrication are provided. These Integrated Design-Manufacturing Processes ('IDMP') include a delta flow that integrates information of the IC fabrication timing and geometry verification processes into the IC design. The delta flow is an incremental flow that includes delta-geometry timing prediction processes and/or delta-timing shape prediction processes for processing difference information associated with circuit characterization parameters. The delta flow independently re-characterizes an IC design using the difference or delta information corresponding to the circuit characterization parameters. The delta flow provides delta outputs (incremental) that enhance or re-characterize corresponding parameters of the devices and interconnect structures without the need to generate new circuit characterization parameters and without the need to re-process all information of the IC design.


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