Shanghai, China

Lester Lu

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Leica Microsystems Ltd., Shanghai. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lester Lu. Retrieved from https://idiyas.com/inventor/lester-lu-8cn79n1y

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: The Innovations of Lester Lu

Introduction

Lester Lu is an accomplished inventor based in Shanghai, China. He has made significant contributions to the field of technology, particularly in the area of printing devices. His innovative approach has led to the development of a unique patent that enhances the functionality of printers.

Latest Patents

Lester Lu holds a patent for a "Printer having slides collecting device." This invention showcases his ability to create practical solutions that improve existing technologies. With 1 patent to his name, he continues to push the boundaries of innovation in the printing industry.

Career Highlights

Lester is currently employed at Leica Microsystems Ltd. in Shanghai. His role at the company allows him to collaborate with other talented professionals and contribute to cutting-edge projects. His work is characterized by a commitment to excellence and a passion for technological advancement.

Collaborations

Lester has worked alongside notable colleagues, including Lisa Li and Hammer Sun. Their combined expertise fosters a creative environment that encourages the development of groundbreaking ideas.

Conclusion

Lester Lu is a remarkable inventor whose contributions to the printing technology sector are noteworthy. His patent and work at Leica Microsystems Ltd. exemplify his dedication to innovation and excellence.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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