Company Filing History:
Years Active: 2002-2007
Title: Innovations by Leslie W Arkless
Introduction
Leslie W Arkless is a notable inventor based in Glasgow, GB. He has made significant contributions to the field of dual damascene fabrication, holding 2 patents that showcase his innovative approach to cleaning chemistry.
Latest Patents
Arkless's latest patents include a "Post etch cleaning composition for dual damascene system." This invention introduces a new cleaning chemistry based on a choline compound, such as choline hydroxide, to address challenges in dual damascene fabrication. The etch stop inorganic layer at the bottom of a dual damascene structure protects the underlying copper interconnect, allowing for improved cleaning. Additionally, he has developed a "Post etch cleaning composition and process for dual damascene system," which utilizes a two-step etch process that leverages the etch stop layer to meet the requirements of ULSI manufacturing in dual damascene structures.
Career Highlights
Leslie W Arkless is currently associated with Ekc Technology Inc., where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in advancing cleaning processes that enhance the efficiency and effectiveness of dual damascene systems.
Collaborations
Arkless has collaborated with notable coworkers, including Catherine M Peyne and David J Maloney, contributing to a dynamic team focused on innovation in cleaning chemistry.
Conclusion
Leslie W Arkless's contributions to the field of dual damascene fabrication through his patents and work at Ekc Technology Inc. highlight his role as a significant inventor in the industry. His innovative approaches continue to shape the future of semiconductor manufacturing.