Leroy Laizhong Luo

Title: Leroy Laizhong Luo: Innovator in Semiconductor Technology

Introduction

Leroy Laizhong Luo is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of photoresist ashing processes. His innovative work has led to advancements that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Leroy Laizhong Luo holds a patent for a process titled "Photoresist ashing process for organic and inorganic polymer dielectric materials." This patent describes a method for removing photoresist from a polymer dielectric on a semiconductor substrate. The process involves generating plasma from a gas containing fluorine compound etchant gases. It effectively etches the substrate with a dielectric layer and a photoresist layer, including the inside walls of microvias formed in the dielectric layer. The etching occurs at temperatures ranging from about 0°C to about 90°C and at pressures of 10 torr or less, ensuring the removal of photoresist residues.

Career Highlights

Leroy's career is marked by his dedication to advancing semiconductor technology. His innovative patent reflects his expertise and commitment to improving manufacturing processes in the industry. His work has been instrumental in enhancing the reliability and performance of semiconductor devices.

Collaborations

Leroy has collaborated with notable colleagues, including Jude Menlo Dunne and Joseph P Kennedy. These partnerships have contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Leroy Laizhong Luo is a distinguished inventor whose contributions to semiconductor technology have made a lasting impact. His innovative patent for a photoresist ashing process showcases his expertise and commitment to advancing the industry.