Oceanside, CA, United States of America

Leroy Dwayne Wielenga

This inventor holds 3 USPTO granted patents. Top assignee: Magnecomp Corporation. Active years: 2010-2012.


% Patents Active = 100.0

Average Co-Inventor Count = 1.3

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2010-2012

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3 patents (USPTO):Explore Patents

Title: Leroy Dwayne Wielenga: Innovator in Load Beam Technology

Introduction

Leroy Dwayne Wielenga is a notable inventor based in Oceanside, CA (US). He has made significant contributions to the field of load beam technology, holding a total of 3 patents. His innovative designs have advanced the functionality and efficiency of head suspensions in various applications.

Latest Patents

Wielenga's latest patents include a "Load beam having a controlled droop angle" and a "Punched gimbal dimple with a coined periphery in a head suspension." The first patent describes a load beam featuring a bent rail and a suspension system that incorporates the load beam. The manufacturing method involves coining the load beam at a specific location before the bent rail is formed. The second patent focuses on a punched gimbal dimple with an annular coined periphery, which enhances the alignment of a slider to the dimple. This design minimizes distortion during the punching process, resulting in a more precise component.

Career Highlights

Wielenga is currently employed at Magnecomp Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in improving the performance of head suspensions, which are critical in data storage devices.

Collaborations

Wielenga has collaborated with talented coworkers such as David Chocholaty and Chu Wong. Their combined expertise has contributed to the successful development of advanced technologies in their field.

Conclusion

Leroy Dwayne Wielenga is a distinguished inventor whose work in load beam technology has made a significant impact. His patents reflect his commitment to innovation and excellence in engineering.

Profile summary based on public USPTO records.
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