Company Filing History:
Years Active: 2002-2003
Title: Innovations by Leonid Vasilyev
Introduction
Leonid Vasilyev is a notable inventor based in Sunnyvale, CA, who has made significant contributions to the field of electron analysis. With a total of 2 patents, his work focuses on advanced methods for measuring elemental concentrations and film thicknesses in various materials.
Latest Patents
Vasilyev's latest patents include "Step function determination of Auger peak intensity" and "Measurement of film thickness by inelastic electron scattering." The first patent describes an electron analyzer and its method of operation that is particularly useful for determining the intensity of an Auger peak of a given element in a sample. This invention allows for the association of peak intensity with the concentration of that element, which can be applied to measuring nitrogen concentration in thin protective films of amorphous carbon or diamond. The second patent outlines a method and apparatus for measuring the thickness of a thin coating, typically ranging from 1 to 10 nm, formed over a substrate of a different atomic number. This method utilizes low-energy secondary electrons to determine film thickness by comparing the secondary electron spectrum of a test sample with reference samples.
Career Highlights
Leonid Vasilyev is currently employed at FEI Company, where he continues to innovate and develop new technologies in electron analysis. His expertise in this field has led to advancements that are valuable in various applications, particularly in materials science.
Collaborations
Throughout his career, Vasilyev has collaborated with notable colleagues, including Sergey Borodyansky and Charles E Bryson, III. These collaborations have contributed to the development of his patents and the advancement of technology in electron analysis.
Conclusion
Leonid Vasilyev's contributions to the field of electron analysis through his innovative patents demonstrate his commitment to advancing technology. His work continues to have a significant impact on the measurement and analysis of materials.
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