Los Altos, CA, United States of America

Leon Conrad Glover, Jr

This inventor holds 1 USPTO granted patent. Top assignee: Raychem Limited. Active years: 1977.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 47(Granted Patents)


Company Filing History:


Years Active: 1977

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1 patent (USPTO):Explore Patents

Title: Leon Conrad Glover, Jr. - Innovator in Adhesive Technology

Introduction

Leon Conrad Glover, Jr. is a notable inventor based in Los Altos, California. He has made significant contributions to the field of adhesive technology, particularly through his innovative patent. His work has implications for various industries that rely on effective adhesive solutions.

Latest Patents

Leon Glover holds a patent for a hot melt adhesive composition. This composition comprises a compatible mixture of an acidic ethylene polymer and a polyamide, along with a minor effective amount of a tackifying agent. The acidic ethylene polymer has an acid number ranging from about 3 to about 80, while the polyamide has an amine number ranging from about 70 to about 400. The components are present in a relative proportion by weight ranging from about 80:20 to 20:80. Additionally, an encapsulation method utilizing this adhesive is described in his patent.

Career Highlights

Glover has worked at Raychem Limited, where he has been able to apply his expertise in adhesive technology. His role at the company has allowed him to develop and refine his innovative ideas, contributing to advancements in the field.

Collaborations

Throughout his career, Leon Glover has collaborated with notable colleagues, including Eugene F. Lopez and Bernard J. Lyons. These collaborations have likely enriched his work and led to further innovations in adhesive technology.

Conclusion

Leon Conrad Glover, Jr. is a distinguished inventor whose contributions to adhesive technology have made a lasting impact. His innovative patent demonstrates his commitment to advancing the field and improving adhesive solutions for various applications.

Profile summary based on public USPTO records.
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