Location History:
- Albuquerque, NM (US) (1990)
- Albuqueque, NM (US) (1991)
- Sunnyvale, CA (US) (1992)
Company Filing History:
Years Active: 1990-1992
Title: Innovations of Leo N Chapin
Introduction
Leo N Chapin is a notable inventor based in Albuquerque, NM (US). He has made significant contributions to the field of materials science, particularly in the development of thin films for ferroelectric applications. With a total of 3 patents, his work has had a considerable impact on the industry.
Latest Patents
Chapin's latest patents include a method for preparing PLZT, PZT, and PLT sol-gels and fabricating thin films suitable for ferroelectric applications. This innovative method involves selecting predetermined amounts of lead, lanthanum, zirconium, and titanium precursors that are soluble in different solvents. The process begins with dissolving these precursors in their respective solvents in proportions that ensure an equal hydrolysis reaction rate for each metal precursor. The reaction is preferably conducted under an inert atmosphere at pressures ranging from about 350 mmHg to 650 mmHg. After mixing the precursors and solvents, water is added to initiate the hydrolysis reaction. Following hydrolysis, the solution is heated to remove excess water and solvent, promoting the formation of a sol-gel. This sol-gel is then applied to a thin substrate and sintered to produce the desired ferroelectric film.
Career Highlights
Chapin has been associated with National Semiconductor Corporation, where he has contributed to various innovative projects. His expertise in materials science and engineering has allowed him to develop methods that enhance the performance of ferroelectric materials.
Collaborations
Throughout his career, Chapin has worked alongside notable colleagues such as William D Miller and Joseph T Evans, Jr. Their collaborative efforts have further advanced the field of ferroelectric thin films.
Conclusion
Leo N Chapin's contributions to the field of materials science, particularly in the development of ferroelectric thin films, highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving manufacturing processes and material properties, making him a significant figure in his field.