Eindhoven, Netherlands

Leo M Weegels

This inventor holds 3 USPTO granted patents. Top assignees: Jds Uniphase Corporation, Koninklijke Philips Corporation N.v.. Active years: 2000-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Leo M Weegels. Retrieved from https://idiyas.com/inventor/leo-m-weegels

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 66.7

Average Co-Inventor Count = 2.8

ph-index = 3

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2000-2003

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3 patents (USPTO):Explore Patents

Title: The Innovations of Leo M Weegels

Introduction

Leo M Weegels is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of optoelectronics and display technology. With a total of 3 patents to his name, Weegels has demonstrated a commitment to innovation and advancement in his area of expertise.

Latest Patents

One of Weegels' latest patents is a display device and lenticular screen. This invention relates to a display device comprising liquid crystal (LC) panels arranged next to each other. To reduce the visibility of seams between adjacent LC panels and to avoid grey scale inversion, collimated light is applied. A lenticular foil is utilized to enlarge the viewing angle in the horizontal direction. If the seam is only present in a vertical direction, the widest viewing angle in the vertical direction should be chosen. This choice leads to an asymmetric viewing angle in the horizontal direction. To reduce the asymmetry in the horizontal viewing angle, the lenticulars of the screen have a trapezoidal shape, with the apex angle depending on the desired spread and viewing angle symmetry in the horizontal direction.

Another significant patent is a method of manufacturing an optoelectronic semiconductor device. This invention allows for the creation of an optoelectronic device, such as a laser of the ridge waveguide type, by using wet or dry etching with a mask. The etching process is halted when an etching stopper layer is reached. A laser produced through wet etching is cost-effective, but it may exhibit a kink in its power-current characteristic at an undesirably low power value. Weegels' method ensures that the mask used is wider than the desired width for the mesa, allowing for a narrow and steep mesa to be realized economically. This innovation is particularly beneficial when used in the GaAs/AlGaAs material system, making it suitable for applications in optical registration and glass fiber communication.

Career Highlights

Throughout his career, Leo M Weegels has worked with prominent companies such as JDS Uniphase Corporation and Koninklijke Philips Corporation N.V. His experience in these organizations has contributed to his expertise and the development of his innovative patents.

Collaborations

Weegels has collaborated with notable individuals in his field, including Johannes Cornelis Van De Ven and Hendrik G Pomp. These

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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