Dublin, CA, United States of America

Lennie Klebanoff



Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Lennie Klebanoff

Introduction

Lennie Klebanoff is a notable inventor based in Dublin, California. He has made significant contributions to the field of semiconductor technology, particularly in the area of gas flow mitigation for optical systems. His work has implications for improving the performance and reliability of semiconductor inspection and lithography apparatus.

Latest Patents

Klebanoff holds a patent titled "Method and system for gas flow mitigation of molecular contamination of optics." This patent describes a computer-implemented method for determining an optimized purge gas flow in semiconductor inspection metrology or lithography apparatus. The method involves receiving various parameters such as permissible contaminant mole fraction, contaminant outgassing flow rate, and molecular weight of a purge gas. It calculates a flow factor and compares it to a predefined maximum flow factor value to ensure optimal performance.

Career Highlights

Throughout his career, Lennie Klebanoff has worked with prominent companies in the technology sector. He has been associated with Kla Tencor Corporation and National Technology & Engineering Solutions of Sandia, LLC. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Klebanoff has collaborated with various professionals in his field, including Gildardo Rios Delgado and Terry J Johnson. These collaborations have contributed to the advancement of his research and the successful implementation of his patented technologies.

Conclusion

Lennie Klebanoff's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to improving industry standards. His work continues to influence the field, paving the way for future advancements in optical systems.

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