Jiangsu, China

Leilei Wang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Abb Schweiz Ag. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Leilei Wang. Retrieved from https://idiyas.com/inventor/leilei-wang-phbkv75m

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Leilei Wang: Innovator in Dropping Device Technology

Introduction

Leilei Wang is a notable inventor based in Jiangsu, China. He has made significant contributions to the field of technology with his innovative designs and patents. His work focuses on creating efficient systems that enhance operational processes.

Latest Patents

Leilei Wang holds a patent for a "Dropping device, system and filling method." This invention includes a feeding port located on the upper side of a dropping chute, designed to receive objects for dropping. The device features a first side wall that extends from the feeding port at a specific angle, and a second side wall that is positioned opposite the first, deviating from the vertical direction at a greater angle. A discharging port is located on the lower side of the device, facilitating the discharge of the object.

Career Highlights

Leilei Wang is currently employed at Abb Schweiz Ag, where he continues to develop and refine his innovative ideas. His work at the company has allowed him to explore new technologies and improve existing systems.

Collaborations

Leilei collaborates with talented coworkers, including Haoteng Lei and Yin Tian, who contribute to his projects and enhance the creative process.

Conclusion

Leilei Wang's contributions to the field of technology, particularly through his patent for a dropping device, showcase his innovative spirit and dedication to improving operational efficiency. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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