Shenzhen, China

Leile Zeng

This inventor holds 1 USPTO granted patent. Top assignee: Shenzhen Cntop Digital Equipment Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Leile Zeng. Retrieved from https://idiyas.com/inventor/leile-zeng

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Leile Zeng: Innovator in Inkjet Printer Maintenance Systems

Introduction

Leile Zeng is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of inkjet printing technology. His innovative approach has led to the development of a unique maintenance system for spray heads in inkjet printers.

Latest Patents

Leile Zeng holds 1 patent for his invention titled "Maintenance system for spray head, inkjet printer, maintenance method and printing method." This patent describes a maintenance system that includes an ink cavity of the spray head communicating with the external environment through spray holes. The system is designed to enhance the efficiency and reliability of inkjet printers.

Career Highlights

Zeng is currently employed at Shenzhen Cntop Digital Equipment Co., Ltd. His work focuses on improving the functionality and maintenance of digital printing equipment. His innovative solutions have positioned him as a key player in the industry.

Collaborations

Leile Zeng collaborates with talented individuals such as Shuzhang Liao and Hua Jiang. Together, they work on advancing technologies in the field of digital printing.

Conclusion

Leile Zeng's contributions to inkjet printing technology demonstrate his commitment to innovation and excellence. His patent for a maintenance system showcases his ability to solve complex problems in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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