This inventor holds 4 USPTO granted patents, plus 1 CIPO patent and 2 EPO patents. Top assignee: Opsis Ab. Active years: 1988-2023.
Location History:
- Lund, SE (1988)
- Malmo, SE (1993)
- Kävlinge, SE (2013)
- Höllviken, SE (2023)
Company Filing History:
Years Active: 1988-2023
Title: Leif Uneus: Innovator in Process Gas Measurement Technologies
Introduction
Leif Uneus is a notable inventor based in Kävlinge, Sweden. He has made significant contributions to the field of process gas measurement, holding a total of four patents. His innovative work focuses on methods and systems that enhance the accuracy of gas content determination.
Latest Patents
Among his latest patents is a method and system for determining the content of hydrogen sulfide (HS) in process gas. This invention involves extracting a sample of the process gas, performing oxidation of the HS, and analyzing the oxidized sample using optical absorption spectroscopy. The results allow for precise determination of HS content in the gas. Another notable patent is a device for radiation absorption measurements, which includes a radiation source and a detector. This device is designed to measure electromagnetic radiation after it has passed through a medium and been reflected by a surface. The calibration method for this device involves directing electromagnetic radiation through a fluid calibration cell.
Career Highlights
Leif Uneus is currently associated with Opsis AB, a company that specializes in environmental monitoring and process control. His work at Opsis AB has allowed him to apply his innovative ideas in practical applications, contributing to advancements in gas measurement technologies.
Collaborations
Throughout his career, Leif has collaborated with various professionals, including his coworker Svante Wallin. These collaborations have fostered an environment