Malung, Sweden

Leif H Skottheim

This inventor holds 10 USPTO granted patents, plus 1 CIPO patent. Top assignees: Sport Maska Inc., Jofa Ab, Jofa Aktiebolag. Active years: 1979-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Leif H Skottheim. Retrieved from https://idiyas.com/inventor/leif-h-skottheim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 60.0


Average Co-Inventor Count = 1.7

ph-index = 7

Forward Citations = 172(Granted Patents)


Company Filing History:


Years Active: 1979-2018

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10 patents (USPTO):Explore Patents

Title: Leif H Skottheim: Innovator in Protective Garments

Introduction

Leif H Skottheim is a notable inventor based in Malung, Sweden. He has made significant contributions to the field of protective garments, holding a total of 10 patents. His innovative designs focus on enhancing safety and comfort for wearers.

Latest Patents

One of Skottheim's latest patents is a protective garment featuring separate inner and outer shells. This garment includes a form-fitting, stretchable inner layer equipped with cushioning pads, while the outer shell contains flexibly interconnected protective pads. The design allows for improved protection of the body, with the outer shell being separable from the inner garment.

Career Highlights

Throughout his career, Leif H Skottheim has worked with several companies, including Sport Maska Inc. and Jofa AB. His experience in these organizations has contributed to his expertise in developing innovative protective solutions.

Collaborations

Skottheim has collaborated with notable individuals in the industry, including Pierre Paiement and Alain Castonguay. These partnerships have further enriched his work and expanded his impact on protective garment technology.

Conclusion

Leif H Skottheim's contributions to the field of protective garments demonstrate his commitment to innovation and safety. His patents reflect a deep understanding of the needs of wearers, making him a significant figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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