This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Leif Eric Delaurentis: Innovator in Magnetron Technology
Introduction
Leif Eric Delaurentis is a notable inventor based in Boulder Creek, California. He has made significant contributions to the field of magnetron technology, particularly in the area of DC magnetron sputtering reactors. His innovative approach has led to the development of a unique patent that enhances the efficiency of sputtering processes.
Latest Patents
Delaurentis holds a patent for a "Sputter magnetron having two rotation diameters." This invention is designed for use in a DC magnetron sputtering reactor, allowing the magnetron to rotate at a smaller diameter during the deposition phase and at a larger diameter during the cleaning phase. This dual functionality enables the removal of sputter material that is redeposited outside of the deposition sputtering track during the cleaning phase. The design includes a swing arm fixed to the magnetron rotation motor shaft, which pivots to establish the two diameters of rotation.
Career Highlights
Leif Eric Delaurentis is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to further develop his expertise in magnetron technology and contribute to advancements in manufacturing processes.
Collaborations
Delaurentis has collaborated with notable colleagues such as Alan Liu and Jianming Fu. Their combined efforts have fostered innovation and progress in the field of magnetron technology.
Conclusion
Leif Eric Delaurentis is a distinguished inventor whose work in magnetron technology has made a significant impact on the industry. His patent for a dual-diameter sputter magnetron exemplifies his innovative spirit and commitment to advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
