This inventor holds 1 USPTO granted patent. Top assignee: Wisconsin Alumni Research Foundation. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: The Innovative Mind of Lei Yang: Pioneering Phase Shifting Technology
Introduction: Lei Yang, a distinguished inventor based in Madison, Wisconsin, has made significant contributions to the field of nanotechnology through his innovative patent. His work focuses on an enhanced bright peak clear phase shifting mask, which has potential applications in advanced imaging technologies, particularly in the realm of X-ray lithography.
Latest Patents: Lei Yang holds one notable patent titled "Enhanced Bright Peak Clear Phase Shifting Mask and Method of Use." This invention features a clear phase shifting mask that is adeptly designed for imaging nanostructures. The mask contains a membrane that is significantly transparent to incoming radiation and features a pair of phase shift regions. These regions play a crucial role in generating an aerial image with distinct edge bright peaks and edge dark peaks during imaging operations. The inventive configuration allows for constructive interference of the edge bright peaks, resulting in an enhanced intensity image bright peak. Another aspect of his patented technology involves imaging two-dimensional features using a specially defined aperture in the phase shifting material to optimize the imaging process.
Career Highlights: Lei Yang's career is marked by his affiliation with the Wisconsin Alumni Research Foundation. His innovative spirit and technical expertise have facilitated advancements in imaging technology, particularly leveraging the unique properties of phase shifting masks for improved resolution in nanostructure imaging.
Collaborations: Throughout his career, Lei has collaborated with notable colleagues such as James Welch Taylor and Francesco Cerrina. These collaborations have enabled a synergistic approach to research and development, further driving innovations in the field of phase shifting technologies and their applications in lithography.
Conclusion: Lei Yang’s inventive contributions, encapsulated in his patent for the enhanced bright peak clear phase shifting mask, illustrate the potential of advanced imaging techniques in nanotechnology. His work, conducted in collaboration with esteemed colleagues at the Wisconsin Alumni Research Foundation, exemplifies the importance of innovation and teamwork in pushing the boundaries of scientific and technological progress. As the field of imaging continues to evolve, inventors like Lei Yang will undoubtedly play a pivotal role in shaping its future.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
