Saguenay, Canada

Lei Pan

This inventor holds 1 USPTO granted patent, plus 2 CIPO patents and 1 EPO patent. Top assignee: Université Du Québec a Chicoutimi. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lei Pan. Retrieved from https://idiyas.com/inventor/lei-pan-idbvoef8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Lei Pan - Innovator in Aluminum Conductor Alloys

Introduction

Lei Pan is a notable inventor based in Saguenay, Canada. He has made significant contributions to the field of materials science, particularly in the development of aluminum conductor alloys. His work focuses on enhancing the properties of aluminum products, making them more efficient and durable.

Latest Patents

Lei Pan holds a patent for "Aluminum conductor alloys having improved creeping resistance." This patent addresses the need for aluminum conductor alloys that exhibit increased creep resistance. The alloy composition includes specific weight percentages of silicon, iron, copper, magnesium, and boron, with aluminum making up the balance. This innovation is crucial for applications where durability and performance are essential.

Career Highlights

Pan is affiliated with the Université du Québec à Chicoutimi, where he conducts research and development in materials science. His work has garnered attention for its practical applications in various industries, particularly in electrical engineering and construction.

Collaborations

Lei Pan collaborates with esteemed colleagues, including Xiao-Grant Chen and Kun Liu. Their combined expertise contributes to advancing research in aluminum alloys and their applications.

Conclusion

Lei Pan's innovative work in aluminum conductor alloys showcases his commitment to improving material properties for practical use. His contributions are vital for the advancement of technology in various sectors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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