Maple Shade, NJ, United States of America

Lee V Hedlund

This inventor holds 9 USPTO granted patents. Top assignee: Rca Inc.. Active years: 1978-1984.


% Patents Active = 100.0

Average Co-Inventor Count = 1.7

ph-index = 6

Forward Citations = 243(Granted Patents)


Location History:

  • Cinnaminson, NJ (US) (1978 - 1979)
  • Maple Shade, NJ (US) (1982 - 1984)

Company Filing History:


Years Active: 1978-1984

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9 patents (USPTO):Explore Patents

Title: The Innovative Mind of Lee V Hedlund: Pioneering Solutions in Tape Technologies

Introduction: Lee V Hedlund, a prolific inventor based in Maple Shade, NJ, has made significant strides in the field of tape technologies. With a total of 9 patents to his name, he has consistently pushed the boundaries of innovation to overcome challenges in VTR systems.

Latest Patents: Among his recent patents is the creation of a "Tunnel for tape accumulation during wind-off," addressing the issue of tape whipping around the headwheel during rewind. Additionally, his invention to combat "drum stall in record and/or replay systems" showcases his ingenuity in resolving technical hurdles in magnetic tape systems.

Career Highlights: Lee V Hedlund's contributions have been instrumental in enhancing the efficiency and reliability of VTR systems. His inventive solutions have garnered recognition for their practicality and effectiveness in improving tape handling and playback mechanisms.

Collaborations: Throughout his career, Lee V Hedlund has collaborated with industry experts such as Donald G Herzog and Ronald P Fink. These partnerships have not only enriched his innovative pursuits but have also led to the development of cutting-edge technologies in the realm of tape-based systems.

Conclusion: In conclusion, Lee V Hedlund stands out as a trailblazer in the field of tape technologies, with a track record of successful patents and collaborative ventures that have reshaped the industry. His relentless pursuit of innovation continues to inspire advancements in VTR systems, setting a high standard for future inventors in the field.

Profile summary based on public USPTO records.
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