Lake Zurich, IL, United States of America

Lee F Radke

This inventor holds 1 USPTO granted patent. Top assignee: Snap-On Technologies, Inc.. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lee F Radke. Retrieved from https://idiyas.com/inventor/lee-f-radke

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 40(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Lee F Radke: Innovator in Display Technology

Introduction

Lee F Radke is an accomplished inventor based in Lake Zurich, IL (US). He has made significant contributions to the field of display technology. His innovative approach has led to the development of a unique patent that enhances user experience.

Latest Patents

Lee F Radke holds a patent for a single-hand held display unit. This invention showcases his ability to create practical solutions that cater to the needs of users. The patent reflects his commitment to advancing technology in a user-friendly manner. He has 1 patent to his name.

Career Highlights

Radke is currently employed at Snap-On Technologies, Inc., where he continues to innovate and develop new technologies. His work at the company has allowed him to apply his inventive skills in a professional setting. He has gained recognition for his contributions to the field.

Collaborations

One of his notable coworkers is Gordon F Schmeisser. Their collaboration has likely fostered an environment of creativity and innovation within their workplace.

Conclusion

Lee F Radke is a notable inventor whose work in display technology has made a significant impact. His patent for a single-hand held display unit exemplifies his innovative spirit and dedication to improving user experience.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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