Location History:
- Clark, NJ (US) (1979)
- Hillsborough, NJ (US) (1983 - 1991)
- Hillsborough, Somerset County, NJ (US) (1994)
Company Filing History:
3 out of 3,345 
2 out of 2,714 
1 out of 745 Years Active: 1979-1994
Title: Lee E Trimble: Innovator in Lithography Technology
Introduction
Lee E Trimble is a notable inventor based in Hillsborough, NJ (US), recognized for his contributions to lithography technology. He holds a total of 6 patents, showcasing his innovative spirit and technical expertise in the field.
Latest Patents
Among his latest patents, Trimble has developed a lithographic mask that comprises a membrane having improved strength. This innovative design features a membrane supported at its edge by an annular, tapered skirt structure. The skirt enhances the attachment of the membrane to the support ring and reinforces the edge region, reducing stress concentrations. In a preferred embodiment, the membrane is created by depositing a polysilicon layer on a silica-based glass substrate, with a portion of the substrate removed to leave a free-standing, tensile film.
Another significant patent involves an X-ray lithography mask and devices made therewith. This mask is produced by forming a thin layer of polycrystalline silicon on a silicon oxide-containing substrate. The exposed portion of the substrate is selectively etched, resulting in a robust membrane of silicon that is in tensile stress, suitable for lithography applications. Metal, X-ray absorbing patterns are then formed on the silicon using standard lithographic procedures.
Career Highlights
Trimble has had a distinguished career, working at renowned institutions such as AT&T Bell Laboratories and Bell Telephone Laboratories. His work in these organizations has significantly advanced the field of lithography and related technologies.
Collaborations
Throughout his career, Trimble has collaborated with notable colleagues, including George K Celler and Harry John Leamy. These collaborations have contributed to the development of innovative technologies and solutions in the industry.
Conclusion
Lee E Trimble's contributions to lithography technology through his patents and career achievements highlight his role as a significant innovator in the field. His work continues to influence advancements in lithographic processes and materials.