Le Ma

Title: Le Ma - Innovator in Semiconductor Technology

Introduction

Le Ma is a prominent inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to optimizing mask parameters and manufacturing semiconductor devices.

Latest Patents

One of Le Ma's latest patents is titled "Method and device for optimizing mask parameters." This patent outlines a method for enhancing mask parameters by acquiring a test pattern, light source parameters, and initial mask parameters. The process involves generating multiple sets of candidate mask parameters, obtaining imaging contrasts for each set, and selecting the optimal mask sidewall angle to improve imaging resolution. Another notable patent is the "Method for manufacturing semiconductor device," which describes a technique for creating a photolithographic coating that forms an optical structure with a high reflection coefficient. This method allows for simultaneous imaging of both the to-be-connected structure and the mask pattern onto the photolithographic film.

Career Highlights

Le Ma is affiliated with the Chinese Academy of Sciences, where he has been instrumental in advancing semiconductor technologies. His work has not only contributed to the academic community but has also had practical applications in the industry.

Collaborations

Le Ma collaborates with esteemed colleagues such as Libin Zhang and Yayi Wei, further enhancing the innovative environment at the Chinese Academy of Sciences.

Conclusion

Le Ma's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in imaging resolution and manufacturing processes.