Mechanicsville, VA, United States of America

Lawrence Varnerin

This inventor holds 1 USPTO granted patent. Top assignee: Infineon Technologies Ag. Active years: 2006.


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2006

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Lawrence Varnerin

Introduction

Lawrence Varnerin is an accomplished inventor based in Mechanicsville, VA (US). He has made significant contributions to the field of photolithography, particularly in enhancing the precision of printed images on substrates. His innovative approach has led to the development of a unique patent that addresses common challenges in the industry.

Latest Patents

Varnerin holds a patent for "Sub-resolution sized assist features." This invention focuses on corner rounding and image shortening, which are substantially reduced in images printed on substrates. The process involves illuminating a photolithographic mask and projecting light transmitted through the mask onto the substrate using an optical projection system. The mask pattern includes at least one printable feature with corners, and it incorporates line features that correspond to these corners. These line features are strategically placed in close proximity to the corners and have a line width smaller than the minimum resolution of the optical projection system. This innovation enhances the quality and accuracy of printed images.

Career Highlights

Lawrence Varnerin is currently employed at Infineon Technologies AG, where he continues to push the boundaries of technology in his field. His work has been instrumental in advancing photolithographic techniques, making him a valuable asset to his company and the industry as a whole.

Collaborations

Throughout his career, Varnerin has collaborated with notable colleagues, including Xiaochun Linda Chen and Bernhard R Liegl. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Lawrence Varnerin's contributions to the field of photolithography exemplify the spirit of innovation. His patent for sub-resolution sized assist features showcases his ability to solve complex problems in image printing. As he continues his work at Infineon Technologies AG, Varnerin remains a key figure in advancing technology in this critical area.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to [email protected]
Loading…