Kenosha, WI, United States of America

Lawrence P Seibel

This inventor holds 10 USPTO granted patents and 1 published patent application. Top assignees: The Valspar Corporation, Label Makers, Inc., The Dexter Corporation. Active years: 1993-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lawrence P Seibel. Retrieved from https://idiyas.com/inventor/lawrence-p-seibel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10 

% Patents Active = 100.0

Average Co-Inventor Count = 1.6

ph-index = 7

Forward Citations = 109(Granted Patents)


Company Filing History:


Years Active: 1993-2003

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10 patents (USPTO):Explore Patents

Title: The Innovative Mind of Lawrence P Seibel

Introduction: Lawrence P Seibel, a talented inventor hailing from Kenosha, WI (US), is known for his groundbreaking contributions to the world of technology and innovation.

Latest Patents: Seibel's latest patents showcase his forward-thinking approach to invention, with a focus on cutting-edge solutions in the fields of robotics and artificial intelligence.

Career Highlights: Throughout his illustrious career, Seibel has consistently pushed the boundaries of what is possible, earning a reputation as a visionary in the tech industry. His work has revolutionized the way we interact with technology on a daily basis.

Collaborations: Seibel has collaborated with some of the brightest minds in the industry, pooling their expertise to create inventions that have left a lasting impact on society. His ability to work seamlessly in a team setting has led to the development of truly innovative solutions.

Conclusion: Lawrence P Seibel's passion for innovation and his relentless drive to create have solidified his place as a pioneering inventor in the world of technology. His contributions continue to inspire future generations of inventors to think outside the box and push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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