Zug, Switzerland

Lawrence Michael Clarke

This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignee: Satisloh Ag. Active years: 2024-2026.


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024-2026

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2 patents (USPTO):Explore Patents

Title: Lawrence Michael Clarke: Innovator in Optical Manufacturing

Introduction

Lawrence Michael Clarke is a notable inventor based in Zug, Switzerland. He has made significant contributions to the field of optical manufacturing, holding a total of 2 patents. His work focuses on enhancing the processes involved in the production of optical elements.

Latest Patents

One of his latest patents is a surfacing station for manufacturing optical elements and related manufacturing facilities. This invention provides a surfacing station designed for processing the surfaces of optical elements as workpieces. It includes a processing unit that is configured to process these surfaces, a controller unit that communicates with a database containing processing protocols, and an identification tag base that determines the identification tags of consumable items used by the surfacing station. The controller unit enables a surfacing protocol for processing the optical elements based on the identified consumable item.

Career Highlights

Lawrence Michael Clarke is currently associated with Satisloh AG, a company known for its innovative solutions in optical manufacturing. His expertise and inventions have contributed to the advancement of technologies in this sector.

Collaborations

He has collaborated with notable coworkers such as Johannes Claar and Michael Kreis, further enhancing the innovative environment at Satisloh AG.

Conclusion

Lawrence Michael Clarke's contributions to optical manufacturing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced manufacturing techniques for optical elements.

Profile summary based on public USPTO records.
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