San Pedro, CA, United States of America

Lawrence H Dirks

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Sakura Finetek U.s.a., Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lawrence H Dirks. Retrieved from https://idiyas.com/inventor/lawrence-h-dirks

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Lawrence H. Dirks

Introduction

Lawrence H. Dirks is a notable inventor based in San Pedro, CA (US). He has made significant contributions to the field of microtomy, particularly with his innovative designs that enhance the functionality and safety of cutting mechanisms.

Latest Patents

Dirks holds a patent for a "Microtome blade guard with integrated blade alignment device." This invention features a microtome blade guard that includes a first arm operable to be coupled to one side of a cutting mechanism and a second arm for the opposite side. A lateral support member is positioned between the two arms, and a staff is coupled to the lateral support member, extending to engage a blade positioned in the blade slot. This design improves the safety and precision of blade handling in microtomes.

Career Highlights

Lawrence H. Dirks is associated with Sakura Finetek U.S.A., Inc., where he applies his expertise in developing advanced microtomy solutions. His work has contributed to the enhancement of laboratory practices, particularly in histology and pathology.

Conclusion

Lawrence H. Dirks exemplifies the spirit of innovation through his contributions to microtomy technology. His patent for the microtome blade guard demonstrates his commitment to improving safety and efficiency in laboratory settings.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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