Location History:
- Charlottesville, VA (US) (2001)
- Eden Prairie, MN (US) (2000 - 2002)
Company Filing History:
Years Active: 2000-2002
Title: Innovations by Lawrence E Carter
Introduction
Lawrence E Carter is a notable inventor based in Eden Prairie, MN (US). He has made significant contributions to the field of microelectronics, holding a total of 3 patents. His work focuses on improving processes that are essential for the manufacturing of electronic devices.
Latest Patents
One of his latest patents is an organic removal process, which discloses an improved method of photoresist removal. This method utilizes a treating solution of ozone and bicarbonate or other suitable radical scavengers to treat a substrate for use in electronic devices. It is particularly effective for photoresist removal when certain metals, such as aluminum and copper, are present on the substrate's surface. Additionally, this method is well-suited for the removal of other organic materials. Another significant patent is the HF/IPA based process for removing undesired oxides from a substrate. This method treats a microelectronics substrate to produce a surface with improved characteristics for subsequent processing. The substrate is treated with HF, IPA, and an inert gas under specific conditions to remove unwanted oxide layers, resulting in a clean silicon surface with low oxygen content, which is beneficial for processes like epitaxial deposition.
Career Highlights
Lawrence E Carter is currently employed at Fsi International, Inc., where he continues to innovate and develop new technologies in the microelectronics sector. His expertise and contributions have made a lasting impact on the industry.
Collaborations
He has collaborated with notable coworkers, including Steven L Nelson and Brent D Schwab, who have also contributed to advancements in their respective fields.
Conclusion
Lawrence E Carter's innovative work in microelectronics, particularly in the area of substrate treatment processes, showcases his commitment to advancing technology. His patents reflect a deep understanding of the challenges in the industry and provide effective solutions for electronic device manufacturing.