Foothill Ranch, CA, United States of America

Lawrence E Camilletti

This inventor holds 1 USPTO granted patent. Top assignee: Conexant Systems, Inc.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lawrence E Camilletti. Retrieved from https://idiyas.com/inventor/lawrence-e-camilletti

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Innovations of Lawrence E Camilletti

Introduction

Lawrence E Camilletti is a notable inventor based in Foothill Ranch, CA (US). He has made significant contributions to the field of semiconductor fabrication, particularly through his innovative patent.

Latest Patents

Camilletti holds a patent titled "Method for fabrication of damascene interconnects and related structures." This patent discloses a method involving the formation of a sacrificial layer over a low-k dielectric. Trenches are etched inside both the sacrificial layer and the low-k dielectric, which are then filled with metal. The process includes two chemical mechanical polishing (CMP) steps to ensure that the metal surface is flush with the low-k dielectric surface, effectively enhancing the fabrication process.

Career Highlights

Lawrence E Camilletti is associated with Conexant Systems, Inc., where he has applied his expertise in semiconductor technologies. His work has contributed to advancements in the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

One of his notable coworkers is Q Z Liu, with whom he has likely collaborated on various projects within the company.

Conclusion

Lawrence E Camilletti's innovative methods in semiconductor fabrication demonstrate his valuable contributions to the field. His patent reflects a significant advancement in technology that benefits the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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