Company Filing History:
Years Active: 1989
Title: The Innovative Mind of Lawrence D. Goodrich
Introduction: Lawrence D. Goodrich, based in Newark Valley, NY, has made significant contributions to the field of photoresist technology. His inventive spirit is showcased through his groundbreaking patent, which has implications for various applications in the electronics industry.
Latest Patents: Goodrich holds a patent for a "Method for developing negative photoresists." This innovative process involves developing images in exposed negative photoresists by treating a substrate coated with the photoresist using a mixture of trichloroethane and an aliphatic alcohol, typically isopropanol or tert-butanol, heated to an elevated temperature. The patent outlines the precise formulation of the alcohol, maintaining a range of 5 to 17 weight percent, optimizing the process for better efficiency and results.
Career Highlights: Lawrence D. Goodrich has spent a considerable portion of his career at the International Business Machines Corporation (IBM), where he has had the opportunity to work on various projects relating to advancements in technology and materials. His research and innovation in the photoresist area represent a notable achievement in his professional journey, contributing to advancements in manufacturing processes.
Collaborations: Throughout his career, Goodrich has collaborated with esteemed coworkers, including Morris Anschel and Barton M. Hetrick. These partnerships have fostered an environment of innovation and creativity, enabling the development of cutting-edge technologies that have played a vital role in the electronics sector.
Conclusion: Lawrence D. Goodrich’s work exemplifies the essence of innovation in the field of photoresist technology. With his sole patent and impactful career at IBM, Goodrich continues to inspire future inventors and researchers in the realm of advanced materials and processes.