The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 1989
Filed:
Oct. 21, 1988
Applicant:
Inventors:
Morris Anschel, Binghamton, NY (US);
Lawrence D Goodrich, Newark Valley, NY (US);
Barton M Hetrick, Wayne, PA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430311 ; 430325 ; 430331 ;
Abstract
A process is provided for developing images in exposed negative photoresists which comprises treating a substrate coated with the photoresist with a mixture of trichloroethane and from about 5 weight % to about 17 weight % of an aliphatic alcohol, preferably isopropanol or tert-butanol, which is heated to an elevated temperature. The alcohol is present in an amount up to that forming a constant boiling composition (azeotropic compositions).