Lawrence Annello Savino

Title: The Innovative Contributions of Lawrence Annello Savino

Introduction

Lawrence Annello Savino is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of photography through his innovative patent. His work has had a lasting impact on photographic technology.

Latest Patents

Savino holds a patent for "Photographic glass plates having antihalation underlayer." This invention involves the preparation of photographic glass plates by directly coating appropriate layer formations onto a glass support. One element of his invention comprises a thin subbing layer (less than 2 µm), an antihalation layer, a silver halide emulsion layer, and a protective overcoat layer that can also include a matting agent or lubricant. Another embodiment features the antihalation layer coated directly onto the support. This patent showcases his innovative approach to enhancing photographic materials.

Career Highlights

Savino is associated with Eastman Kodak Company, a leader in imaging technology. His work at this prestigious company has allowed him to contribute to advancements in photographic technology. His dedication to innovation is evident in his patent and the impact it has had on the industry.

Collaborations

Savino has collaborated with Ronald J. Schmidt, further enhancing the scope of his work and contributions to the field. Their partnership exemplifies the collaborative spirit that drives innovation in technology.

Conclusion

Lawrence Annello Savino's contributions to photographic technology through his patent demonstrate his innovative spirit and commitment to advancing the field. His work continues to influence the industry and inspire future inventors.