This inventor holds 1 USPTO granted patent. Top assignee: Arch Specialty Chemicals, Inc.. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2005
Title: The Innovations of Lawerence Ferreira
Introduction
Lawerence Ferreira is an accomplished inventor based in Fall River, MA. He has made significant contributions to the field of photoresist compositions, which are essential in the production of patterned images on substrates. His innovative work has led to the development of a patented technology that enhances the capabilities of radiation-sensitive compositions.
Latest Patents
Lawerence Ferreira holds 1 patent for his work on photoresist compositions. This patent focuses on radiation-sensitive compositions that are utilized in creating patterned images on various substrates. His invention represents a notable advancement in the field of materials science and photolithography.
Career Highlights
Ferreira is currently employed at Arch Specialty Chemicals, Inc., where he continues to develop and refine chemical compositions for industrial applications. His role at the company allows him to leverage his expertise in chemistry and innovation to contribute to the advancement of specialty chemicals.
Collaborations
Throughout his career, Lawerence has collaborated with notable colleagues, including David J Brzozowy and J Thomas Kocab. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of innovative solutions.
Conclusion
Lawerence Ferreira's contributions to the field of photoresist compositions exemplify the impact of innovation in chemical engineering. His work not only advances technology but also enhances the capabilities of industries reliant on precision imaging.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile