Lauri Johnson

Title: Lauri Johnson: Innovator in Photoresist Removal Solutions

Introduction

Lauri Johnson is a notable inventor based in Greenfield, Indiana, recognized for her contributions to the field of chemical solutions for substrate cleaning. With a focus on developing effective methods for removing photoresists, her work has significant implications in various industries, particularly in semiconductor manufacturing.

Latest Patents

Lauri Johnson holds a patent for a "Dynamic multi-purpose composition for the removal of photoresists and method for its use." This patent outlines solutions and processes designed to remove substances from substrates, including photoresist. The solutions consist of dimethylsulfoxide, a quaternary ammonium hydroxide, an alkanolamine, and less than 3% by weight water of the total weight of the solution. The quaternary ammonium hydroxide can include compounds such as tetramethylammonium hydroxide, dimethyldipropylammonium hydroxide, or methyltriethylammonium hydroxide. Additionally, the solutions may incorporate a secondary solvent, which can be an alcohol or ethylene glycol. The patent also describes methods for preparing and utilizing these solutions effectively.

Career Highlights

Lauri Johnson has made significant strides in her career, particularly through her work at Dynaloy, LLC. Her innovative approach to developing cleaning solutions has positioned her as a key player in the industry. With her patent, she has contributed to advancing the technology used in substrate cleaning processes.

Collaborations

Lauri collaborates with talented individuals such as Michael Tod Phenis and Raymond Chan, who contribute to her projects and enhance the innovative environment at Dynaloy, LLC.

Conclusion

Lauri Johnson's work in developing dynamic compositions for photoresist removal showcases her innovative spirit and dedication to advancing chemical solutions in the industry. Her contributions are vital for improving processes in semiconductor manufacturing and beyond.