Munich, Germany

Lauri Aleksi Iiola

This inventor holds 1 USPTO granted patent. Top assignee: Nokia Technologies Oy. Active years: 2026.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Lauri Aleksi Iiola: Innovator in 3D Mesh Geometry Compression

Introduction

Lauri Aleksi Iiola is a notable inventor based in Munich, Germany. He has made significant contributions to the field of 3D object data processing. His innovative work focuses on the compression of mesh geometry, which is crucial for various applications in computer graphics and modeling.

Latest Patents

Lauri Aleksi Iiola holds a patent for the "Compression of mesh geometry based on 3D patch contours." This patent describes an apparatus that includes one or more processors and memories storing instructions. When executed, these instructions enable the apparatus to segment a mesh of three-dimensional object data into patches, determine contours, generate a contour mesh, and encode it into a bitstream using a coding method. This invention enhances the efficiency of processing 3D data, making it more manageable for various applications.

Career Highlights

Lauri is currently employed at Nokia Technologies Oy, where he continues to develop innovative solutions in technology. His work at Nokia has allowed him to explore new frontiers in 3D data processing and contribute to advancements in the field.

Collaborations

Lauri collaborates with talented individuals such as Lukasz Kondrad and Sebastian Schwarz. Their combined expertise fosters a creative environment that drives innovation and enhances the development of new technologies.

Conclusion

Lauri Aleksi Iiola is a prominent figure in the realm of 3D mesh geometry compression. His contributions through patents and collaborations reflect his commitment to advancing technology in this field. His work continues to influence the way 3D data is processed and utilized across various industries.

Profile summary based on public USPTO records.
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