Baltimore, MD, United States of America

Lauretta Welch

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: 180S, Inc., US Army. Active years: 2008-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lauretta Welch. Retrieved from https://idiyas.com/inventor/lauretta-welch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 51(Granted Patents)


Company Filing History:


Years Active: 2008-2025

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2 patents (USPTO):Explore Patents

Title: Lauretta Welch: Innovator in Protective Headwear and Garment Technology

Introduction

Lauretta Welch is a notable inventor based in Baltimore, MD (US), recognized for her contributions to protective headwear and garment technology. With a total of 2 patents, she has made significant strides in enhancing safety and comfort in apparel.

Latest Patents

Welch's latest patents include innovative designs such as protective headwear and a garment assembly that facilitates a secure fit with gas masks. The protective headwear system incorporates a tensioner system to ensure a tight fit between the neoprene facial seal and the gas mask. Additionally, her garment with a venting structure offers a method for improved airflow, enhancing user comfort during wear.

Career Highlights

Throughout her career, Lauretta Welch has worked with prominent organizations, including 180s, Inc. and the US Army. Her experience in these companies has allowed her to develop practical solutions that address real-world challenges in protective apparel.

Collaborations

Welch has collaborated with talented individuals such as Inna Alesina and Nestor M Benavides, contributing to her innovative projects and expanding her impact in the field.

Conclusion

Lauretta Welch's inventive spirit and dedication to improving protective headwear and garment technology have established her as a significant figure in her field. Her patents reflect her commitment to safety and innovation, making her a valuable contributor to the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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