Pourrieres, France

Laurent Truphemus


 

Average Co-Inventor Count = 2.3

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2014-2023

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5 patents (USPTO):Explore Patents

Title: The Innovative Mind of Laurent Truphemus

Introduction

Laurent Truphemus is a notable inventor based in Pourrieres, France. He has made significant contributions to the field of integrated circuits, holding a total of five patents. His work focuses on enhancing the efficiency and functionality of electronic components.

Latest Patents

Among his latest patents is a "Method for precharging an integrated-circuit supply, and corresponding integrated circuit." This invention involves an integrated circuit that includes a primary supply stage and a secondary supply stage, designed to deliver voltages to a volatile memory circuit. The circuit features a supply-switching mechanism that allows for efficient power management. Another significant patent is the "Process for managing the start-up of a phase-locked loop, and corresponding integrated circuit." This innovation addresses the start-up phase of a phase lock loop (PLL) circuit, optimizing the control pulses and pre-charge current to enhance performance.

Career Highlights

Laurent Truphemus has worked with prominent companies in the semiconductor industry, including STMicroelectronics in Rousset and Grenoble. His experience in these organizations has allowed him to develop and refine his innovative ideas in integrated circuit technology.

Collaborations

Throughout his career, Laurent has collaborated with talented individuals such as Bruno Gailhard and Christophe Eva. These partnerships have contributed to the advancement of his projects and the successful development of his patents.

Conclusion

Laurent Truphemus exemplifies the spirit of innovation in the field of integrated circuits. His patents reflect a deep understanding of electronic systems and a commitment to improving technology. His contributions continue to influence the industry and inspire future advancements.

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