This inventor holds 1 USPTO granted patent. Top assignee: Oerlikon Trading Ag, Truebbach. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: The Innovations of Laurent Sanonnens
Introduction
Laurent Sanonnens is a notable inventor based in Concise, France. He has made significant contributions to the field of plasma technology, particularly in the treatment of large area substrates. His innovative approach has led to the development of a unique method that addresses voltage non-uniformity in high-frequency plasma reactors.
Latest Patents
Sanonnens holds a patent for a "Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates." This invention involves a vacuum vessel and at least two electrodes that define an internal process space. A substrate holder is used to hold the substrate to be treated within this space. Notably, at least one of the electrodes features a concave profile along a first cross section and a convex profile along a second cross section, with both cross sections being parallel. Gas is introduced into the space through a gas inlet, and power is supplied to the electrodes to facilitate the treatment of the substrate. He has 1 patent to his name.
Career Highlights
Laurent Sanonnens is currently employed at Oerlikon Trading AG, located in Truebbach. His work at this company has allowed him to further develop his expertise in plasma technology and contribute to advancements in the field.
Collaborations
Throughout his career, Sanonnens has collaborated with several talented individuals, including Jacques Schmitt and Mustapha Elyaakoubi. These collaborations have enriched his work and fostered innovation in the projects they have undertaken together.
Conclusion
Laurent Sanonnens is a distinguished inventor whose work in plasma technology has made a significant impact. His innovative patent addresses critical challenges in the treatment of large area substrates, showcasing his expertise and dedication to advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
