Company Filing History:
Years Active: 2006
Title: The Innovations of Laurent S. Vesier
Introduction
Laurent S. Vesier is an accomplished inventor based in Bear, Delaware, known for his contributions to the field of chemical mechanical polishing. With a focus on enhancing the efficiency and effectiveness of polishing pads, Vesier has made significant strides in this specialized area of materials science.
Latest Patents
Vesier holds a patent for a "Resilient polishing pad for chemical mechanical polishing." This innovative polishing pad features a base layer and a polishing layer that are bonded together using a hot-melt adhesive. The unique formulation of the hot-melt adhesive provides a Tpeel strength of at least greater than 40 Newtons at 305 mm/min, which effectively reduces pad delamination. This advancement is crucial for improving the durability and performance of polishing pads in various applications.
Career Highlights
Vesier is currently employed at Rohm and Haas Electronic Materials CMP Holdings, Inc., where he continues to develop and refine technologies related to chemical mechanical polishing. His work has not only contributed to the company's success but has also positioned him as a key figure in the industry.
Collaborations
Vesier collaborates with various professionals in his field, including his coworker John V. H. Roberts. Together, they work on innovative solutions that push the boundaries of current technologies in polishing materials.
Conclusion
Laurent S. Vesier's contributions to the field of chemical mechanical polishing exemplify the impact of innovation in materials science. His patented work on resilient polishing pads demonstrates a commitment to enhancing product performance and reliability.