La Tronche, France

Laurence Vertallier


Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 202(Granted Patents)


Location History:

  • Saint Pierre d'Allevard, FR (2012)
  • La Tronche, FR (2015 - 2017)

Company Filing History:


Years Active: 2012-2017

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Laurence Vertallier

Introduction

Laurence Vertallier is a notable inventor based in La Tronche, France. He has made significant contributions to the field of orthopedic surgery through his innovative patents. With a total of three patents to his name, Vertallier's work focuses on enhancing surgical procedures and improving patient outcomes.

Latest Patents

One of Laurence Vertallier's latest patents is a system and method for determining an optimal type and position of an implant. This computer-assisted orthopedic surgery system includes a device for generating a three-dimensional geometrical surface model of a first bone. It also features a database containing three-dimensional implant models of various available implants. The system allows a user to select a first implant from the database and displays the three-dimensional implant model on a screen. The computer superimposes the implant model on top of the model of the first bone, ensuring that the two models are visually identifiable from one another.

Career Highlights

Throughout his career, Laurence Vertallier has worked with several companies, including Perception Raisonnement Action En Médecine and Omnilife Science, Inc. His experience in these organizations has contributed to his expertise in the field of orthopedic technology.

Collaborations

Laurence has collaborated with notable individuals such as Stephane Lavallee and Carinne Cecile Granchi, who have contributed to his projects and innovations.

Conclusion

Laurence Vertallier's innovative work in orthopedic surgery exemplifies the impact of technology on medical practices. His patents reflect a commitment to improving surgical outcomes and advancing the field.

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