East Palo Alto, CA, United States of America

Laurence T Maloney

This inventor holds 1 USPTO granted patent. Top assignee: Leland Stanford Junior University. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Laurence T Maloney. Retrieved from https://idiyas.com/inventor/laurence-t-maloney

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Laurence T. Maloney

Introduction

Laurence T. Maloney is a notable inventor based in East Palo Alto, California. He has made significant contributions to the field of color imaging processes. His work focuses on separating the effects of ambient lighting from surface reflectance, which is crucial for analyzing material properties.

Latest Patents

Maloney holds a patent for a color imaging process. This method is designed to separate the effect of ambient lighting from the effects of surface reflectance. It utilizes data from N+1 sensor classes to create a finite dimensional approximation of a surface reflectance function at each image point. Additionally, it approximates the ambient light, which is essential for accurate analysis.

Career Highlights

Maloney is affiliated with Leland Stanford Junior University, where he continues to advance research in imaging technologies. His innovative approach has garnered attention in the academic community and beyond.

Collaborations

One of his notable collaborators is Brian A. Wandell. Together, they have worked on projects that enhance the understanding of visual perception and imaging.

Conclusion

Laurence T. Maloney's contributions to color imaging processes exemplify the intersection of technology and research. His innovative methods continue to influence the field and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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