Company Filing History:
Years Active: 2006
Title: The Innovative Contributions of Lauren Hall
Introduction
Lauren Hall is a prominent inventor based in San Jose, CA. She has made significant strides in the field of chemical vapor deposition processes. Her work focuses on enhancing the efficiency and effectiveness of gap filling in high aspect ratio structures.
Latest Patents
Lauren Hall holds a patent for a "Hydrogen-based phosphosilicate glass process for gap fill of high aspect ratio structures." This innovative process utilizes chemical vapor deposition to fill narrow width gaps, typically measuring 1.5 microns or less, with a reduced incidence of voids or weak spots. The process involves the use of hydrogen and a phosphorus dopant precursor as process gases in a reactive mixture within a plasma-containing CVD reactor. Additionally, the process gas includes dielectric forming precursor molecules such as silicon and oxygen-containing compounds. This patent showcases her expertise and commitment to advancing technology in her field. She has 1 patent to her name.
Career Highlights
Lauren Hall has built a successful career at Novellus Systems Incorporated, where she has contributed to various innovative projects. Her work has been instrumental in developing advanced materials and processes that are crucial for modern semiconductor manufacturing.
Collaborations
Lauren has collaborated with notable colleagues, including George D Papasouliotis and Md Sazzadur Rahman. These partnerships have further enriched her research and development efforts.
Conclusion
Lauren Hall's contributions to the field of chemical vapor deposition and her innovative patent highlight her role as a leading inventor. Her work continues to influence advancements in semiconductor technology and materials science.