Laura Lazar

Title: Laura Lazar: Innovator in Semiconductor Technology

Introduction

Laura Lazar is a prominent inventor based in Munich, Germany. She has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase her innovative approaches to silicon layer structuring and patterning.

Latest Patents

Her latest patents include a method for structuring a silicon layer, which involves applying a lacquer mask onto the silicon layer. This method allows for selective etching relative to the lacquer mask using an etching gas mixture comprising SF, HBr, and He/O. The openings etched into the silicon layer feature especially steep sidewalls, and the etching selectivity relative to the lacquer mask is notably improved. Another patent focuses on a method for patterning a layer of silicon and fabricating an integrated semiconductor circuit. In this process, a hard mask made from polysilicon is used to etch a layer to be patterned. The hard mask is patterned using a resist mask, and the etching is performed in such a way that the openings in the hard mask have inclined sidewalls. This technique allows for the formation of smaller openings in the layer to be patterned than those predetermined by the resist mask.

Career Highlights

Laura Lazar is currently employed at Infineon Technologies AG, where she continues to push the boundaries of semiconductor innovation. Her work has been instrumental in advancing the efficiency and precision of semiconductor manufacturing processes.

Collaborations

One of her notable collaborators is Matthias Krönke, with whom she has worked closely on various projects within the company.

Conclusion

Laura Lazar's contributions to semiconductor technology through her innovative patents and collaborative efforts highlight her role as a leading inventor in the field. Her work continues to influence advancements in semiconductor manufacturing processes.