This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2012.
Company Filing History:
Years Active: 2012
Title: Innovations by Laszlo Ladanyi
Introduction
Laszlo Ladanyi is a notable inventor based in Peekskill, NY (US). He has made significant contributions to the field of integrated circuit patterning. His innovative approach has led to the development of a unique patent that addresses challenges in lithographic patterning.
Latest Patents
Ladanyi holds a patent titled "Dynamic provisional decomposition of lithographic patterns having different interaction ranges." This patent outlines a method for obtaining mask and source patterns for printing integrated circuit patterns. The method involves providing initial representations of various mask and source patterns. It identifies long-range and short-range factors in these representations and provides a plurality of clips that include a specified number of mask patterns. The method also determines an initial processing priority for the clips and establishes a patterning relationship between integrated circuit patterns and the mask and source patterns. The primary objective of this method is to express the printability of the integrated circuit patterns in terms of the established patterning relationship. The process iteratively solves a master problem to generate values for long-range factors and solves subproblems for short-range factors.
Career Highlights
Laszlo Ladanyi is associated with International Business Machines Corporation (IBM), where he has contributed to advancements in technology and innovation. His work has been instrumental in enhancing the efficiency and effectiveness of integrated circuit manufacturing processes.
Collaborations
Ladanyi has collaborated with notable colleagues such as Saeed Reza Bagheri and Francisco Barahona. These collaborations have further enriched his work and contributed to the development of innovative solutions in the field.
Conclusion
Laszlo Ladanyi's contributions to the field of integrated circuit patterning through his patent and work at IBM highlight his role as a significant inventor. His innovative methods continue to influence advancements in technology and manufacturing processes.