This inventor holds 1 USPTO granted patent. Top assignee: Infineon Technologies Ag. Active years: 2007.
Company Filing History:
Years Active: 2007
Title: Lars Völkel: Innovator in Semiconductor Coatings
Introduction
Lars Völkel is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology. His innovative work focuses on developing advanced materials for semiconductor substrates.
Latest Patents
Lars Völkel holds a patent for a photosensitive lacquer designed for providing a coating on a semiconductor substrate or a mask. This photosensitive resist comprises a photo acid generator, a solvent, and at least two different base polymers. The first base polymer contains cycloaliphatic parent structures that absorb incident light at 248 nm while remaining transparent to light at 193 nm. The second base polymer consists of aromatic parent structures that absorb light at 193 nm and are transparent to light at 248 nm. When applied in a coat thickness of 50 to 400 nm, this resist achieves a high structure contrast, improved stability to etching, and a reduction of defects during exposure at a wavelength of 193 nm.
Career Highlights
Lars Völkel is currently employed at Infineon Technologies AG, where he continues to advance semiconductor technologies. His work has been instrumental in enhancing the performance and reliability of semiconductor devices.
Collaborations
Lars collaborates with Michael Rogalli, contributing to the development of innovative solutions in the semiconductor industry.
Conclusion
Lars Völkel's contributions to semiconductor coatings exemplify the importance of innovation in technology. His patent reflects a significant advancement in the field, showcasing his expertise and commitment to excellence.