Bad Abbach, Germany

Lars Naehle

This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignee: Ams-Osram International Gmbh. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lars Naehle. Retrieved from https://idiyas.com/inventor/lars-naehle

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Lars Naehle: Innovator in Electromagnetic Components

Introduction

Lars Naehle is a notable inventor based in Bad Abbach, Germany. He has made significant contributions to the field of electromagnetic components, particularly through his innovative designs and methods.

Latest Patents

Lars Naehle holds 1 patent for a component with a structured connection surface and a method for operating such a component. This invention involves a main part designed to generate electromagnetic radiation and a contact structure with multiple individually actuatable segments. The structured connection surface is defined by internal boundary surfaces, allowing for a pixelated current impression into the main part.

Career Highlights

Lars Naehle is currently associated with Ams-Osram International GmbH, where he continues to develop cutting-edge technologies in the field of electromagnetic components. His work has been instrumental in advancing the capabilities of such components in various applications.

Collaborations

Lars collaborates with Sven Gerhard, contributing to innovative projects and enhancing the research and development efforts at their company.

Conclusion

Lars Naehle's contributions to the field of electromagnetic components highlight his role as a key innovator. His patent and ongoing work at Ams-Osram International GmbH demonstrate his commitment to advancing technology in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…